アルミニウムのイオン窒化に関する研究
プレスパッタリングガスの影響
1988 年 39 巻 7 号 p. 393-398
詳細
1988 年 39 巻 7 号 p. 393-398
Studies were made on ion nitriding of aluminum at 400-650°C in 3.8 Torr nitrogen atomosphere by dc glow discharge. An aluminum nitride layer was formed on aluminum surface at temperatures as low as 450°C as a result of argon sputtering prior to the nitriding. The argon sputtering removed aluminum oxide layers from the initial surface and resulted in production of conical protrusions a few micrometers in height on the surface. Sputtering with nitrogen or hydrogen did not cause surface changes that occurred in argon sputtering and no aluminum nitride layers were formed. Microvickers hardness testing showed layer hardness to be about Hv (0.01) 1000.
