電析法によるNi/S合金の析出過程と非晶質膜の形成

抄録

Ni-S amorphous alloy film was deposited by a method using an electroplating bath containing Na₂S₂O₃, and the deposition conditions were considered in detail. The structure of the Ni-S alloy film changed with changes in plating current density, Na₂S₂O₃ concentration and bath pH, but the structual changes were determined by changes in the S content in the deposited film. X-ray diffraction patterns showed that films containing about 40 at %S consisted of amorphous alloy. The process of Ni-S alloy film deposition was studied by means of electrochemical polarization and controlled potential plating methods.