抄録
Ultramicrotomy was employed to prepare thin cross-sections of the barrier oxide films grown on etched aluminum foils for capacitor applications. It was found that the sections as thin as 10nm could be prepared successfully. Examination of the ultramicrotomed sections by transmission electron microscopy revealed a number of important structural features of the films that have not been reported previously. Of particular importance is that the nature and origin of film defects have been clarified and classified for the first time.
