表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
エチレンジアミン浴からのパラジウム-ニッケル合金めっきに関する研究
III. 非対称交流電解法による研究
アブリミティ アブライティ松永 守央津留 豊細川 邦典
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1993 年 44 巻 3 号 p. 242-246

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An investigation of asymmetric alternating current plating (AACP) of Pd-Ni alloy has revealed that a marked improvement in the morphologies of Pd-Ni alloy deposits is achieved, and crack formation is inhibited.
Deposits obtained by AACP at a cathode peak current density (icp) of -0.6∼-1.4A/dm2, an anode peak current density (iap) of 0.2∼0.6A/dm2, and a period (θ) of 10ms were bright, smooth and completely crack free. In a bath of 0.05mol/dm3 PdCl2, 0.12mol/dm3 NiCl2, 0.51mol/dm3 ethylenediamine having a pH of 7, current efficiency was virtually consistent with the theoretical value for the plating condition described above. The palladium content of the deposits was a content 94∼96% irrespective of icp iap and θ. However, it decreased with increases in nickle ion concentration.

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