表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
ホスホン酸系溶液中における銅の孔食に及ぼすCl-の影響
山田 豊世利 修美田頭 孝介永田 公二
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1993 年 44 巻 9 号 p. 753-756

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The pitting corrosion of copper in cold water containing inhibitors composed of nitrilotris methylene triphosphonic acid (ATMP), benzotriazole (BTA) and zinc sulfate (ZnSO4) has been studied using immersion tests and electrochemical measurements. The results obtained are summarized as follows: 1) Pitting corrosion was influenced by SO42- rather than Cl-. 2) The presence of both SO42- and Cl- in ATMP+BTA solution was conducive to pitting corrosion. 3) In ATMP+BTA solutions containg SO42-, breakdown potential Eb was linearly dependent on Cl- and is thought to affect the critical breakdown potential.

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