抄録
Amorphous (a-) Fe-B alloy films for micro-magnetic device applications were fabricated by electrodeposition. It was found that an appropriate KBH4 concentration greater than 300mM and a bath temperature of less than 30°C were indispensable deposition conditions for obtaining a-Fe-B films with a B concentration exceeding 20at%. Furthermore, a-Fe-B films with low coercivity of less than 3.6 Oe and a large magnetostrictive constant of 26×10-6, which are thus comparable to sputtered a-Fe-B films, can be obtained by using a combined complex agent consisting of KNaC4H4O6 and (NH4)2SO4. ESCA measurements showed that about 80at% boron chemically bound with iron, but about 20at% boron combined with oxygen, because the electrodeposited films contain oxygen and carbon.
