表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
電析法による高比抵抗Ni-Fe系軟磁性薄膜の作製
高井 まどか近藤 祥目羅 史明加世田 学逢坂 哲彌
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1998 年 49 巻 3 号 p. 292-296

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We attempted to increase resistivity (ρ) while maintaing good soft magnetic properties by using industrial-grade permalloy (Ni80Fe20) as a core material. We added diethylenetriamine (DET) as an organic additive to NiFe bath to increase resistivity. The adding of 3∼4ppm of DET produced a film with resistivity three times resistivity as high as Ni80Fe20, and the higher resistivity film retained the good soft magnetic properties due to the codeposition of small amounts of carbon and sulfur. Increased resistivity was caused because the resulting microstructure contained more minute crystal grains than the conventional microstructure. The higher resistivity NiFe film exhibits higher permeability than that of conventional Ni80Fe20 film above 30MHz because eddy current loss is suppresed.

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