表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
接触めっき法によるFe-B二元系アモルファス合金薄膜の作製と磁気特性
藤田 直幸P. B. LIM牧野 栄治井上 光輝荒井 賢一藤井 壽崇
著者情報
ジャーナル フリー

1998 年 49 巻 7 号 p. 769-774

詳細
抄録

Fe-B amorphous alloy film was formed by means of contact plating method, in which Cu foils in contact with Al wires were used as substrates. Local battery configuration of the Cu foil anode and the Al wire cathode was responsible for film formation. The boron content in film was controlled from 0at% to 28at% by changing the KBH4 concentration in the bath. The bath temperature strongly affected the crystallographic structure of resultant films. Fe80B20 amorphous films required a bath temperature below 40°C. Film structure and composition also affected magnetic properties. Film coercivity below 17Oe was also observed.

著者関連情報
© (社)表面技術協会
前の記事 次の記事
feedback
Top