表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
接触めっき法によるFe-B二元系アモルファス合金薄膜の作製と磁気特性
藤田 直幸, P. B. LIM, 牧野 栄治, 井上 光輝, 荒井 賢一, 藤井 壽崇
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1998 年 49 巻 7 号 p. 769-774

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Fe-B amorphous alloy film was formed by means of contact plating method, in which Cu foils in contact with Al wires were used as substrates. Local battery configuration of the Cu foil anode and the Al wire cathode was responsible for film formation. The boron content in film was controlled from 0at% to 28at% by changing the KBH4 concentration in the bath. The bath temperature strongly affected the crystallographic structure of resultant films. Fe80B20 amorphous films required a bath temperature below 40°C. Film structure and composition also affected magnetic properties. Film coercivity below 17Oe was also observed.
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