高純度シリコンの製造に関する研究 (第3報)
SiHCl3の精留および赤外吸収スペクトルによる実験
1963 年 79 巻 896 号 p. 105-110
詳細
1963 年 79 巻 896 号 p. 105-110
To purify SiHCl3 further, an all-quartz fractionation apparatus was built. One column was packed with small quartz single-turn helices and the other packed with stainless steel dixon, and operations were carried out semicontinuously in argon atomosphere. Spectral analysis and the properties of pulled crystals showed the main fraction had been purified effectively. The traped liquid of hydrogen reduction process was separated by this apparatus, and about 34% SiHCl3 and 66% SiCl4 were obtained.
By the use of infrared absorption spectrum, the occurrence of SiH2Cl2 in traped liquid, the identification of SiHCl3 and SiCI4 were also found.
