抄録
Chemical vapor deposition of VB2 on mild steel substrate was carried out with the hydrogen reduction of VOCl3-BCl3 mixture at the temperature range of 1, 073 to 1, 223K, [VOCl3/(VOCl3+BCl3)] gas molar ratio region of 0.23 to 0.61, and reduction time of 1.8ks.
Thin films of 50μm consisting of pure VB2 phase have been synthesized on the conditions of substrate temperature 1, 173K, and the gas ratio above 0.40. Smooth surface film of VB2 having micro-vickers hardness of about Hmv 2, 800 have been prepared at gas ratio above 0.5.
