Modeling and Control for Rapid Thermal Anneal in RTP

Akihiro Hosokawa; Hideaki Kanoh; Tatsufumi Kusuda; Seihiro Sasaki; Kozo Terashima

doi:10.11499/sicep.2002.0.580.0

SICE Annual Conference 2002

DOI https://doi.org/10.11499/sicep.2002.0.580.0

会議情報

主催: The Society of Instrument and Control Engineers

共催: IEEE/Industiral Electronic Society, IEEE/Robotics and Automation Society, IEEE/Control System Society

Modeling and Control for Rapid Thermal Anneal in RTP

Akihiro Hosokawa, Hideaki Kanoh, Tatsufumi Kusuda, Seihiro Sasaki, Kozo Terashima

著者情報

キーワード: rapid thermal processor, feed forward, temperature control

会議録・要旨集フリー

p. 580

詳細

抄録

A wafer temperature control system is developed for Spike RTA. The nonlinear model of a halogen lamp developed in this paper does not require the filament temperature for identification. A nonlinear feedforward controller based on this model is applied to the latest rapid thermal processor, by which good tracking performance to set points and repeatability of top temperature are verified.

責任著者(Corresponding author)

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