Section B
Optimization of the Interface between Graphene and Gate Insulator Studied by Hard X-ray Photoelectron Spectroscopy for Future CMOS Channel
Daiyu Kondo, Kenjiro Hayashi, Junichi Yamaguchi, Ikuo Soga, Shintaro Sato, Naoki Yokoyama
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2019 Volume 7 Issue 1 Pages 40-43
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