抄録
Chemical vapor deposition （CVD） is generally employed to prepare thin films, whereas CVD can also prepare nano-particles by homogeneous nucleation in a gas phase or on support powder as catalyst. Although fluidized-bed CVD （FBCVD） has often been used to prepare particle/film on fluidized powder, the powder size of FBCVD is rather limited to several 10 to 100μm in diameter to fluidize powder in a gas phase. We have developed Rotary CVD （RCVD）, which has no limitation of powder size to deposit. Ni nano-particles a few nanometer in diameter were prepared on Al2O3, mesoporous silica and Zeorite powders by RCVD using Nickelocene precursor. Ni nano-particles were deposited inside mesoporous silica showing more than 6 times higher H2 production by steam methane reforming reaction than that of conventional Ni catalyst.
