貴金属ナノ粒子の無電解置換析出とシリコン表面高機能化への応用

抄録

Electroless displacement deposition on silicon is a facile wet process, i.e. immersing silicon substrates or silicon powder into a simple metal salt solution including hydrofluoric acid. It can selectively deposit noble metal and copper nanoparticles onto silicon. The size and distribution density of nanoparticles depend on the surface conditions of silicon and deposition conditions. The deposited nanoparticles can work as effective catalysts on silicon, such as solar to chemical conversion using photoelectrochemical cells, autocatalytic electroless deposition of adhesive metal films, and metal-assisted etching. The etching can produce porous silicon and silicon nanohole arrays, which act as optical antireflection thin films.