化学気相析出法による材料の表面改質による高機能化

抄録

Surface modification by coating ceramic layers can add new functionality to substrate materials or can protect substrate materials from harsh environments. Materials design in surface modification will be greatly enhanced by precise and careful control of crystal orientation and microstructure in the ceramic coatings. Chemical vapor deposition (CVD) is a versatile coating method with excellent controllability of crystal orientation and microstructure by deposition conditions and conformal step coverage on not only wafer substrate with processed surface but powder or fiber substances. This article introduces self-oriented growth and epitaxial growth as methods for controlling crystal orientation and microstructure in CVD process, and novel self-organized phenomena with ordered structure in ceramic eutectic systems via CVD process.