粉体工学会誌
Online ISSN : 1883-7239
Print ISSN : 0386-6157
ISSN-L : 0386-6157
解説
日本の伝統模様を応用した半導体の熱流制御
キム ビョンギ野村 政宏
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ジャーナル 認証あり

2025 年 62 巻 4 号 p. 224-229

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This article explores the innovative application of the traditional Japanese “Seigaiha” (blue ocean wave) pattern to nanoscale silicon structures for thermal management in semiconductor devices. We investigate the anisotropic in-plane thermal conduction in silicon thin films with nanoscale Seigaiha patterns using micro time-domain thermoreflectance measurements across a wide temperature range (4–300 K). Our findings reveal a remarkable reversal of thermal conductivity anisotropy below 80 K, attributed to the transition from diffusive to quasi-ballistic phonon transport regimes. Monte Carlo simulations elucidate the underlying mechanisms, demonstrating how the unique geometry of the Seigaiha pattern influences phonon propagation and creates thermally dead volumes. This research not only advances our understanding of nanoscale heat transport but also showcases the potential of integrating cultural design elements with cutting-edge nanotechnology. The results provide valuable insights for directional heat dissipation in electronic devices and open new avenues for thermal management strategies in semiconductor technology.

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