Fabrication of 2D Layered Material by Sputtering Deposition

Abstract

In the recent years, 2D materials have drawing increasing attention due to its favorable electrical properties and intriguing physical properties. Among the various fabrication technique, we employ sputtering deposition. It has been revealed that the film quality heavily depends on the substrate surface condition, deposition environment, and the form of the film itself. We have been reporting on the film quality dependence on each of those parameters for transition metal dichalcogenides in particular. We will report and discuss on those progresses we have made.