鉄と鋼
Online ISSN : 1883-2954
Print ISSN : 0021-1575
ISSN-L : 0021-1575
イオンスパッタリングによる酸化物のX線光電子ペクトルの変化
橋本 哲広川 吉之助福田 安生鈴木 堅市鈴木 敏子薄木 智亮源内 規夫吉田 鎮男甲田 満瀬崎 博史堀江 浩田中 彰博大坪 孝至
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1992 年 78 巻 1 号 p. 149-156

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Round-robin experiments have been performed in order to establish the correction of binding energy shift of XPS spectra in oxides by the chargeup which results from the radiation of X-rays or ion sputtering and to determine the criteria for the change of chemical state by Ar ion sputtering. Samples of Al2O3, SiO2, MgO, TiO2 and NiO, in plate and powder form, were used for the experiments. We determined that the difference in energy between the Al 2p (Si 2p or Mg 1s) line and the O 1s line gives a better correction of the measurements of the binding energy shift of Al2O3 (SiO2 or MgO) than that between the Al 2p (Si 2p or Mg 1s) line and the C is line. After Ar ion sputtering, TiO2 and NiO are reduced and damage is induced in the case of Al2O3 and SiO2, while MgO remains stable, as examined using the binding energy and FWHM of XPS spectra. We revealed that the changes caused by ion sputtering of oxides depend on the change of free formation enthalpy and the ionicity. We also showed that both plate and powder samples are useful as standards for determining the binding energy from XPS spectra.

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