抄録
This paper describes the details of a new co-sputtering device (Multi-Source Trio) designed for the SPRINTER 750 sputtering system for MO production (MiniDisk, 3.5″ or smaller formats). Focussing on TbFeCo films we present data for changing the magnetic properties of the film by adjusting the sputter power level on the individual targets with different elemental composition. Special emphasis is placed on the composition uniformity throughout the disk which has been shown to be better than 0.2%.
