Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Effect of Annealing Temperature of Palladium Oxide Films on Gasochromic Performance
S. YamamotoK. TakanoA. InouyeM. Yoshikawa
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2007 年 32 巻 1 号 p. 171-174

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The effect of annealing temperature of Pd films on the gasochromic performance for hydrogen gas has been investigated. The Pd films prepared using an rf magnetron sputtering on quartz glass and glassy carbon substrates were annealed at temperatures range from 300 to 900°C in air. The films are characterized by Rutherford backscattering spectrometry (RBS) and X-ray diffraction (XRD). The gasochromic performance of palladium oxide films coated with a 15 nm thickness Pd catalyst is examined by optical transmittance in hydrogen. The polycrystalline PdO film which is thermally oxidized at 600°C in air shows the superior gasochromic performance. The optical transmittance of the film is rapidly decreased down to 10 % within 2 minute exposures to 1 % H2/Ar at room temperature. It is found that the gasochromic coloration of palladium oxide films for hydrogen is strongly influenced by annealing temperature.
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© 2007 The Materials Research Society of Japan
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