Transactions of the Materials Research Society of Japan
Online ISSN : 2188-1650
Print ISSN : 1382-3469
ISSN-L : 1382-3469
Nanolevel Polishing Using MCF
Y. MatsuoK. YamamotoK. Shimada
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2009 年 34 巻 1 号 p. 149-152

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抄録
Recently, manufacturing of high tolerance with promoting downsizing of various electronic components is required for lighter, thinner, shorter, and smaller communication equipments and electronics products using cellular phone and digital camera. In these circumstances, new type mirror polishing technology has been developed in order to polish nm-order for surface of ceramics, metal, and plastics. This technology can be polished high accuracy as follows: (1) acrylic resin of irregularity shape, (2) acrylic resin of film. This paper describes the possibility of the surface treatment of acrylic resin of the three dimensional nano-level polishing using MCF(magnetic compound fluid).
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© 2009 The Materials Research Society of Japan
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