2009 年 34 巻 2 号 p. 309-312
We formed high density platinum-silicide nanodots on an ultrathin SiO2 layer and characterized their electronic charged states by an AFM/Kelvin probe technique. A ~1.8-nm-thick Pt film deposited on pre-grown Si quantum dots (Si-QDs) with an areal dot density of ~1.2 × 1011 cm–2 was exposed to remote hydrogen plasma. The formation of platinum-silicide nanodots with an areal dot density of ~1.2 × 1011 cm–2 was confirmed after examining the surface morphology and measuring the valence band spectra by AFM and XPS, respectively. The surface potential of the nanodots changed in a stepwise manner with respect to the tip bias due to multistep electron injection into and extraction from the platinum-silicide nanodots.