Local Deposition of Carbon Containing SiO_X Synthesized Using Atmospheric Pressure Microplasma Jet

抄録

Local deposition of carbon containing SiO_X was studied by using a very-high-frequency (VHF) inductive coupling microplasma jet (MPJ) from a tetraethoxysilane ((Si(OC₂H₅)₄), TEOS) and argon mixture. Two distinct thickness profiles were observed in the product, i.e., the dome shaped profiles with and without a hollow at the center region. The products showed a strong white photoluminescence emission. The gas flow dependent deposition profile of products is discussed in terms of the film thickness, chemical composition, and photoluminescence characterizations.