抄録
Nanosize fibers were formed by RF O2 plasma etching of flat diamond-like carbon (DLC) film. The DLC films were deposited on Si substrates by an RF plasma chemical vapor deposition (CVD) method and subsequently etched by the RF O2 plasma. The length (height) of nanofibers increased and the thickness of remaining bulk DLC layer decreased with increasing etching duration. It was due to 10 times difference in etching rates at the top of nanofibers and on the bottom surface of nanofibers. After disappearance of the bulk DLC layer, the length of nanofiber gradually decreased and the diameter slightly increased with increasing etching duration, and finally deformed into candle-like shapes due to sputtering and re-deposition. The effects of electrical charging up locally on the top of fibers and of unintentional contamination of Cu sputtered from electrode were considered as the mechanisms for initiation of selective etching, formation and deformation of nanofibers.
