We demonstrate the wavelength trimming of MEMS VCSELs by etching a cantilever-shaped top mirror using FIB etching. The proposed technique can be used for the post-process precise wavelength allocation of athermal MEMS VCSELs. The modeling and experimental results on 850nm MEMS VCSELs are presented. The results show a possibility of realizing both red-shift and blue-shift wavelength changes by choosing the etching area of the cantilever.
