IEICE Transactions on Electronics
Online ISSN : 1745-1353
Print ISSN : 0916-8524
Regular Section
Robust Design Method of Multilayer Antireflection Coating for Organic Solar Cells
Shigeru KUBOTAKensaku KANOMATAKatsuaki MOMIYAMATakahiko SUZUKIFumihiko HIROSE
著者情報
ジャーナル 認証あり

2013 年 E96.C 巻 4 号 p. 604-611

詳細
抄録

We present an optimization algorithm for the design of multilayer antireflection (AR) coatings for organic photovoltaic (OPV) cells. When a set of available materials for the AR films is given, the proposed method allows for searching the globally optimized AR structure that maximizes the short-circuit current density (JSC) under simulated solar light illumination (AM 1.5). By applying this method to an OPV solar cell with a configuration of Al/P3HT:PCBM/MoO3/ITO, we demonstrated that JSC can increase by 7.5% with a 6-layer AR coating, consisting of MgF2, ZnS, and Al2O3. A notable feature of this method is that it can find not only the optimal solution, which maximizes JSC, but also the quasi-optimal solutions, which increase JSC to nearly maximum levels. We showed that the quasi-optimal solution may have higher robustness against deviations in film thicknesses, from their designated values. This method indicates the importance of practically useful, non-optimal solutions for designing AR coatings. The present method allows for extending the user's choices and facilitates the realization of a practical design for an AR coating.

著者関連情報
© 2013 The Institute of Electronics, Information and Communication Engineers
前の記事 次の記事
feedback
Top