Plasmonic Plasma Deposition Using Nanostructured Materials on Si Substrates

Abstract

With the sophistication of various surface processes by non-equilibrium plasma in the gas phase, it is a certain necessity in the direction of scientific and technological development to incorporate extended reaction fields due to the non-equilibrium nature of solid plasma and to design integrated non-equilibrium reaction fields. In this paper, we introduce the plasmon resonance of nanoparticles on silicon wafers and chemical reactions on the surface layer enabled by radicals supplied by plasma. Plasma deposition can be performed at room temperature using plasmon resonance of nanoparticles on Si substrates. The case using gold nanoparticles and the case using HfN nanoparticles are shown.