Denki Kagaku oyobi Kogyo Butsuri Kagaku

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Volume 63, Issue 6

Displaying 1-17 of 17 articles from this issue

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Vision

Semiconductor Integrated Circuit Technology and Eectrochemistry

Shunri ODA

1995 Volume 63 Issue 6 Pages 455
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.455

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Technical Papers

Resistance to Moisture of GaAs IC in Plastic Mold Package

Yoshihiro SAITO, Tatsuya HASHINAGA, Noboru GOTO, Hideaki NISHIZAWA

1995 Volume 63 Issue 6 Pages 456-459
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.456

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Enhanced Thermal Oxidation of Silicon by Oxygen Jet

Koichiro HOH, Nobuo KAKIMOTO, Takayuki TOYODA, Nobuo HANEJI

1995 Volume 63 Issue 6 Pages 460-465
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.460

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Photoresist with Anti-Cracked and Fine Profile for High Speed Gold Bump Plating

Koji SAITO, Hiroshi KOMANO, Toshimi AOYAMA

1995 Volume 63 Issue 6 Pages 466-472
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.466

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Electrodeposition of Ni-Fe-Mo Multilayered Soft Magnetic Films with High Specific Resistance

Osamu SHINOURA

1995 Volume 63 Issue 6 Pages 473-478
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.473

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Generation of Excited Hydrogen Atoms and Its Application to Thin Film Fabrications for Electronic Materials

Tomo UENO, Yuichi AKIBA, Takeshi AKIYAMA, Koichi KUROIWA

1995 Volume 63 Issue 6 Pages 479-484
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.479

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Oxidation of Silicon in Ultradry Ozone

Toshiro NAKANISHI, Yasuhisa SATO, Masaki OKUNO, Kanetake TAKASAKI

1995 Volume 63 Issue 6 Pages 485-488
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.485

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Ellipsometric Analysis of Strained InGa_xAs_1-x/GaAs Quantum Well Structures

Tadashi SAITOH, Yukimune WATANABE, Tadayoshi TSUCHIYA

1995 Volume 63 Issue 6 Pages 489-493
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.489

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Trace Analysis of Contamination in LSI Fabrication Process Environment

Norikuni YABUMOTO, Makiko TANAKA

1995 Volume 63 Issue 6 Pages 494-498
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.494

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Technological Reports

Lithographic Characteristics of an Attenuated Phase-shifting Mask Using a Single-layer Absorptive Shifter

Junji MIYAZAKI, Tetsuro HANAWA, Akihiro NAKAE, Nobuyuki YOSHIOKA, Wata ...

1995 Volume 63 Issue 6 Pages 499-504
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.499

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Novel Evaluation Methods of Silicon Epitaxial Layer Lifetimes by Photoluminescence Technique and Surface Charge Analysis

Yoshinori HAYAMIZU, Yutaka KITAGAWARA, Ryoji HOSHI, Takao TAKENAKA

1995 Volume 63 Issue 6 Pages 505-512
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.505

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Selective Deposition of Titanium Silicide Films by Plasma-Enhanced Chemical Vapor Deposition and Related Processes for Silicide-Clad Silicon Electrode Formation

Kunio SAITO, Takao AMAZAWA, Yoshinobu ARITA

1995 Volume 63 Issue 6 Pages 513-523
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.513

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Note

Effect of Alloying Elements on Oxidation Resistance and Creep Characteristics of Copper

Kazumi FUJII, Shiro KOBAYASHI, Katsumi IIJIMA, Mituo KURIYAMA, Masahik ...

1995 Volume 63 Issue 6 Pages 524-526
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.524

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Communications

Effect of Electric Field on Transmission Spectra of a Four-layer Flim Consisting of Ga-doped ZnO, undoped ZnO, SiO₂, and Ga-doped ZnO

Kenkichiro KOBAYASHI, Kazuaki KUMEGAWA, Shigenori MATSUSHIMA, Genji OK ...

1995 Volume 63 Issue 6 Pages 527-528
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.527

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Preparation of Polycrystalline Bi₃Fe₅O₁₂ Films by Annealing Process

Eiji KOMURO, Tatsuru NAMIKAWA, Yohtaro YAMAZAKI

1995 Volume 63 Issue 6 Pages 529-530
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.529

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Comprehensive Technical Papers

ZnMgSSe and Related Hetero-structures Grown by Metalorganic Chemical Vapor Deposition

Atsushi TODA, Akira ISHIBASHI

1995 Volume 63 Issue 6 Pages 531-535
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.531

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Optical Lithography Using a Transmittance-adjusted Conjugate Pupil Filter and Oblique Illumination

Toshiyuki HORIUCHI, Katsuhiro HARADA, Seitaro MTSUO

1995 Volume 63 Issue 6 Pages 536-552
Published: June 05, 1995
Released on J-STAGE: September 15, 2019

DOIhttps://doi.org/10.5796/kogyobutsurikagaku.63.536

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