Journal of Photopolymer Science and Technology

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Volume 37 (2024) Issue 2 Pages 147-149

The Photopolymer Science and Technology Award

Makoto Hanabata

The Photopolymer Science and Technology Award No. 241100, the Outstanding Achievement Award 2024 was presented to Dr. Makoto Hanabata (Photofunctional Materials Research Co., Ltd.) for his outstanding achievements in photopolymer science and technology, “Pioneering Technology of the Novolak-Diazonaphthoquinone resist design for g-line(436nm) and i-line(365nm) photoresist platform and materials”.

Volume 36 (2023) Issue 1 Pages 7-10

The Photopolymer Science and Technology Award

Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

The Photopolymer Science and Technology Award No. 232100, the Best Paper Award 2022, was presented to Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe (Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 35, (2022) 61-65, entitled “Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist”.

Volume 36 (2023) Issue 1 Pages 5-6

The Photopolymer Science and Technology Award

Seihou Jinnai, Yutaka Ie

The Photopolymer Science and Technology Award No. 222100, the Best Paper Award 2021, was presented to Seihou Jinnai and Yutaka Ie (The Institute of Scientific and Industrial Research (SANKEN), Osaka University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 34, (2021) 285-290, entitled “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”.

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2024 Volume 37 Issue 6

Retraction of “Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials” [J. Photopolym. Sci. Technol., 36 (2023) 267-270] Masahiro Furutani, Wataru Usui, Chiharu Nishibata
Current Status of EUV Flood Exposure Tool at NewSUBARU BL03 Ryuta Shiga, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe
Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy Tsukasa Sasakura, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering Yuri Ebuchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

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