The Photopolymer Science and Technology Award No. 232100, the Best Paper Award 2022, was presented to Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe (Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 35, (2022) 61-65, entitled “Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist”.
The Photopolymer Science and Technology Award No. 222100, the Best Paper Award 2021, was presented to Seihou Jinnai and Yutaka Ie (The Institute of Scientific and Industrial Research (SANKEN), Osaka University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 34, (2021) 285-290, entitled “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”.
The Photopolymer Science and Technology Award No. 212100, the Best Paper Award 2021, was presented to Tomotaka Tsuchimura (FUJIFILM Corporation) for his outstanding contribution published in Journal of Photopolymer Science and Technology, 33, (2020) 15-26, entitled “Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials”.
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography
Released on J-STAGE: May 31, 2024 |
Volume 37
Issue 1
Pages 129-134
Takahiro Kozawa
3
Naphthoic Acid Derivatives as Photosensitizers for Short-wavelength α-Hydroxyacetophenone Photoinitiators
Released on J-STAGE: May 31, 2024 |
Volume 37
Issue 1
Pages 135-140