Dry Deposition and Dry Development of Metal Oxide Based Photoresist
Released on J-STAGE: July 31, 2024 |
Volume 37
Issue 3
Pages 257-262
Nizan Kenane, Anuja De Silva, Ali Haider, Linh Hoang, Ching-Chung Huang, Benjamin Kam, Ji Yeon Kim, Younghee Lee, Da Li, Samantha Tan, Tim Weidman, Cheng Hao Wu, Jengyi Yu, Guoyan Zhang, Yichi Zhang, Robert L. Brainard, Gregory Denbeaux, Nicolas Maldonado, Nitinkumar S. Upadhyay, Mark Sherwood