The chemical regimes of various photochemical products were investigated using the CBMIV photochemical model. According to the analyses by isopleths diagrams, clear regime boundary lines were detected for the main products, NO
2, HNO
3, O
3 and PAN, and minor products, HNO
2, N
2O
5, HNO
4 and NO
3, along with further radicals generated in the HO
x-cycle. A similarity law of regime boundary, the same initial concentration ratio of precursors (VOC
0/NO
x0) producing the same regime boundary, is confirmed for the various photochemical products. Based on the analyses, the NO
x consumptions during the photochemical process are described by a pseudo-first-order reaction model solely depending on the VOC
0/NO
x0 condition. This result is thought to be one of the reasons for the similarity law. As a useful result of our analyses, a clear inhibition role of NO
x emissions in the VOC-limited regime for HNO
3, O
3 and PAN formation is found. NO
x reduction may cause an increase in these species concentrations. Further research is needed for the NO
x reduction effects on these important species.
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