Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
解説
スパッタリングシミュレーションにおける分子動力学法とモンテカルロ法の比較
村本 哲也剣持 貴弘
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2008 年 51 巻 4 号 p. 264-269

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抄録
  Low-energy sputtering is studied through molecular dynamics (MD) and binary-collision approximation (BCA) simulations. First, MD simulations as a preliminary study are performed for 5 keV Ar impacts on a Cu target. When random numbers gave the direction of the target crystal axis for each impact, the total sputtering yield almost agreed with the experimental yield of a polycrystalline Cu target. Second, we performed MD and BCA simulations for self-sputtering of W with incident energy of 100 eV and incident angles of 0°-85°. We found that the many-body collision results in high-yield sputtering at grazing incidence. The incident angle dependence of sputtering yields fade out for an MD result with a rough surface.
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© 2008 一般社団法人日本真空学会
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