マイクロチップ電気泳動分析用の凸型鋳型ガラス基板の簡易作製

抄録

The conventional photolithography-chemical wet-etching method for preparing a convex mold usually uses a metal-coated glass or silicon-wafer substrate, and thus produces a waste solution containing heavy metal such as chromium. In this work, a simple photolithography-chemical wet-etching method using a slide glass without a coating of metal was proposed to fabricate a convex mold for preparing a PDMS (polydimethylsiloxane) microchip. A photoresist was directly coated on a cleaned slide glass, and was prebaked for 90 s. After covering with a photo-mask, the coated slide glass was illuminated with UV-visible light, followed by development with a developing reagent. Then, the slide glass was etched in a 1 M HF/1 M NH₄F solution for a certain time. Finally, the etched slide glass was cleaned with acetone for removing the remaining photoresist. A PDMS microchip with a cross microchannel was prepared using the convex mold. The microchip was used for the electrophoresis of two fluorescent dyes and fluorescent labeled protein A. The experimental results showed that the simple method without using a metal-coated substrate could be used for convex molds for preparing microchips.