New Matrix Polymers for Photo-activated Resin Composites using Di-α-fluoroacrylic Acid Derivatives

抄録

A novel matrix resin for photo-activated resin composites was developed using α-fluoroacrylic acid derivatives. To render resin composites with improved mechanical properties, silica fillers were also used. It was found that the newly developed fluorine-substituted monomer was polymerized quite easily not only by free radical chemical initiators, but also by photo-irradiation using free radical photoinitiator system. In particular, the photopolymerization rate of the novel monomer was more than two times faster than that of corresponding methacrylate-based monomer. Composite based on the newly developed matrix resin had higher micro-Vickers hardness and compressive strength values than the methacrylate-based composite, and that it contained only trace residual monomers compared with the methacrylate-based material. The high polymerization conversion of the fluorine-substituted monomer could be attributed to the polar effect or the small steric hindrance of fluorine at the α-position.