Development of a Simple Probe for Non-Destructive Reversible Electric Contact to nm-Thick Films and 2D Films

抄録

A simple probe that is applicable as an electric contact to nm-thick films and 2D films such as graphene and MoS₂ without destroying the specimen has been developed. The concept of the development of the probe is based on the repulsive region used in atomic force microscopy technique but without any precise feedback. The robust electric contact with the probe has been demonstrated by biased XPS measurement of a MOS specimen and by resistivity measurement of a 5-layer graphene film on sapphire. It has also proved that there was no detectable damage or contaminations on the specimens after the measurements. [DOI: 10.1380/ejssnt.2015.307]