抄録
Adsorption behaviors of alkylamine compounds in UPW (ultra pure water) on hydrogen-terminated Si(100) were elucidated mainly by ToF-SIMS. Si wafers cleaned by heat treatment in 500°C were etched in 0.38% HF and soaked in water solution of alkylamine after 1 min UPW rinse. The peak intensity of amine molecular ions and SiH/Si ratio detected by ToF-SIMS are considered to be used as a measure of quantity of adsorbed molecules and surface oxidation, respectively. It was found that hydrophobic amine molecules with longer CH2 chain tend to be left with high concentration in a very short time of soaking and also tend to have the larger effect on the increase of surface oxidation of hydrogen-terminated surface. The latter phenomenon was explained by an I-effect of alkyl group. [DOI: 10.1380/ejssnt.2006.644]
