Selective dewetting of polymers on metal/silicon micro-patterns

Olaf Karthaus; Takuto Terayama; Yuichi Hashimoto

doi:10.1380/ejssnt.2006.656

Regular Papers

Selective dewetting of polymers on metal/silicon micro-patterns

Olaf Karthaus, Takuto Terayama, Yuichi Hashimoto

著者情報

キーワード: Atomic force microscopy, Conductivity, Photoluminescence, Amorphous thin films, Metal-insulator interfaces, Nano-electronics and related devices, Polymers, Dewetting

ジャーナルフリー

2006 年 4 巻 p. 656-660

DOI https://doi.org/10.1380/ejssnt.2006.656

詳細

抄録

Modification of electrode surfaces plays an important role for electronics. Most often, lithography techniques are used, but they suffer from high fabrication cost, material restrictions and size limitations. Here we investigate if dewetting can be used to selectively coat a micron-sized gold stripe electrode on a silicon substrate. [DOI: 10.1380/ejssnt.2006.656]

責任著者(Corresponding author)

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