抄録
Atomic-scale surface modification of silicate glass plates was demonstrated by applying a thermal nanoimprint technique using self-assembled oxide nanopattern molds, which were atomically stepped sapphires (α-Al2O3 single crystal) (step height of about 0.2 nm and terrace width of about 100 nm) or originally developed multiple nanogrooved NiO thin films (groove depth, width, and separation of about 25, 70, and 150 nm, respectively). Atomically stepped or nanowire patterns were successfully formed on the nanoimprinted glass surface. The former surface-modified glass has atomic steps (step height of about 0.2 nm) and atomically smooth terraces (RMS roughness of about 0.10 nm). The stepped pattern on the nanoimprinted glass (glass transition temperature of 521°C) disappeared after annealing at temperatures above 600°C. In addition, glass nanoimprint on the atomically stepped glass plate using graphite molds (highly oriented pyrolytic graphite (HOPG)) was examined preliminarily. [DOI: 10.1380/ejssnt.2010.44]
