IEICE Electronics Express
Online ISSN : 1349-2543
ISSN-L : 1349-2543
LETTER
Development of high-yield fabrication technique for MEMS-PhC devices
A. HigoS. IwamotoS. IshidaY. ArakawaM. TokushimaA. GomyoH. YamadaH. FujitaH. Toshiyoshi
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JOURNALS FREE ACCESS

2006 Volume 3 Issue 3 Pages 39-43

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Abstract

We propose a high-yield fabrication processing technique for the MEMS (micro electro mechanical system) modulators integrated with two-dimensional photonic crystal waveguides. Polysilicon microactuators for evanescent modulation was successfully developed by using the vapor hydrofluoric-acid releasing technique for stiction-free sacrificial release, during which the SOI photonic-crystal waveguides were protected under the LPCVD silicon nitride film. Post-release anneal was found to be needed to remove the byproduct made by the reaction of hydrofluoric acid with silicon nitride film. Preliminary optical modulation result (-2dB modulation with 86V) was experimentally obtained.

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© 2006 by The Institute of Electronics, Information and Communication Engineers
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