Logic area reduction using the deep trench isolation technique based on 40nm embedded PCM process

抄録

There is a growing demand for embedded non-volatile memory (eNVM) in Internet of Things (IoTs). Phase change memory (PCM) is a promising candidate for next generation eNVM with excellent CMOS process compatibility. Deep trench isolation (DTI) process is one of the extra steps to generate the diode selectors for PCM cells under 40 nm CMOS process. In this paper, we propose a 40 nm Non-volatile Standard cell Library (NSL) by reusing the DTI process to minimize the space among active areas. Thus, benefit from the embedded PCM (emPCM) process, the area of logic circuits can be reduced by using NSL. To verify the validity of the NSL, four ring oscillators are fabricated by using the normal standard cell library and NSL. The measured results show that the circuits by NSL work well and there is almost no performance sacrifice.