IEICE Electronics Express
Online ISSN : 1349-2543
ISSN-L : 1349-2543

この記事には本公開記事があります。本公開記事を参照してください。
引用する場合も本公開記事を引用してください。

Si-Based Ka-band SIW Band-pass Filter using Wafer Level Manufacturing Process
Hanxiang ZhuJun LiLiqiang CaoJia CaoPengwei Chen
著者情報
ジャーナル フリー 早期公開

論文ID: 17.20200414

この記事には本公開記事があります。
詳細
抄録

In this letter, a SIW (substrate integrated waveguide) linear coupling band-pass filter working in Ka-band is presented, it is designed to be a part of a Ka-band receiver front end. Due to the super heterodyne structure of the receiver, the system contains lots of chips, therefore stacked packaging structure is used. Considering the heat dissipation efficiency, process accuracy and cost, novel wafer-level silicon manufacturing process is adopted to fabricate the SIW filter. The design of the filter employs the coupling coefficients extraction method. Finally, a fourth-order band-pass filter was designed, manufactured and tested. The measured results are in good agreement with the simulation results, verifying the practicability of the silicon-based SIW filter in RF front end microsystem.

著者関連情報
© 2020 by The Institute of Electronics, Information and Communication Engineers
feedback
Top