電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
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ゾルゲル法によるTi:Er:LiNbO3薄膜の作製と物性評価
芳賀 剛梶谷 尚史深見 宮子高橋 誠脇田 紘一佐橋 家隆音羽 亮平
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2006 年 126 巻 1 号 p. 8-13

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Ti4+ and Er3+ LiNbO3 films on the z-cut congruent LiNbO3(CLN) wafer substrates were grown by using a sol-gel method. The orientation relationships between films and substrates were determined by x-ray diffraction, Raman spectroscopy, scanning electron microscope(SEM), and the results showed that (006) oriented LiNbO3 epitaxial layers with parallel epitaxial relationships could be grown on a z-cut CLN wafer substrate. Er3+ exhibited an emission at 1.53μm and efficient luminosity in the visible light could be observed from Ti:Er:LiNbO3 films. The strongest luminosity was observed for the films with Ti4+concentration 1.5 mol% and Er3+concentration 0.05 mol% Ti:Er:LiNbO3 films.
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