抄録
An extreme ultraviolet source using laser-produced lithium plasma has been studied. The authors obtained an enhancement of extreme ultraviolet conversion efficiency by a factor of about 2 with recombination wall. In a planar lithium target experiment, the maximum conversion efficiency of 2.3% was achieved by using pulsed 2ω YAG laser irradiation. These results suggest that a Li target is a reasonable candidate for the EUV lithography source.
