電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
<電子物性・デバイス>
分子ビーム注入におけるドーパント分子の解離距離の制御性
中川 幸子神田 久生Gerhard Betz
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2010 年 130 巻 12 号 p. 2182-2187

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A specific crystalline defect in diamond may work as a NOT gate in a quantum computer. It is called NV-N center that is composed of two substitutional nitrogen atoms that are separated by c.a. 1.5 nm and one of them is adjacent to a vacancy. In order to find an optimal condition to produce it using a low-energy (100 ∼ 500 eV/atom) N2 beam implantation, we performed an empirical molecular dynamic simulation. By a high-temperatures implantation at 900∼1000 K, the formation probability of such desired NV-N centers was 5 ∼ 10%, which is comparable with a measured data.
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