電気学会論文誌C(電子・情報・システム部門誌)
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
<電子物性・デバイス>
放射光光電子分光で観た酸素分子によるNi(001)表面酸化膜形成の反応機構
寺岡 有殿岩井 優太郎
著者情報
ジャーナル フリー

2017 年 137 巻 3 号 p. 394-399

詳細
抄録

Chemical reaction dynamics on the oxide formation at the Ni(001) surface has been studied via two quantum beams (synchrotron radiation and supersonic molecular beam). It was revealed that NiO layers formation took place at an oxygen coverage less than 0.5 ML depending on translational energy of oxygen molecules. Although dissociative adsorption of oxygen takes place via physical adsorption at lower translational energy than 0.06 eV, direct activated adsorption occurs at higher energy. Potential energy barrier height is 0.3 eV for the first barrier and 1.6 eV for the second one, respectively.

著者関連情報
© 2017 電気学会
前の記事 次の記事
feedback
Top