トリメチルアルミニウム/エタノールの組み合わせによる有機無機ハイブリッド薄膜の室温分子層堆積

抄録

Atomic layer deposition (ALD), which is a type of chemical vapor deposition, has realized ultra-thin film deposition of inorganic materials and growth of conformal layer films by using a continuous automatic stop function. In this study, we focused on the molecular layer deposition (MLD) method that enables the deposition of thin films of organic and organic-inorganic hybrids by taking advantage of the features of ALD. By using trimethylaluminum (TMA) and ethanol (EtOH) as starting materials, we succeeded in the molecular layer deposition of thin films of organic-inorganic hybrids at room temperature, and the deposition density was improved by comparison with atomic layer deposition of TMA and water vapor.