Development of a Sub-micron Processing Method with Ion Implantation

抄録

We have developed a precise sub-μm processing method by combining ion implantation and nano-plating. In order to show the applicability of this method, we have fabricated a mask for a Bragg grating, which has a striped gold structure with a height of 1.2 μm and a period of 1.59 μm on a 2-μm thick SiN membrane. We have also confirmed that the mask pattern can be transferred inside a silica glass by ion implantation. It is expected that this result can be utilized for the fabrication of optical communication devices.