電気学会論文誌A(基礎・材料・共通部門誌)
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
特集論文
Nitrogen Atom Densities in Rare Gas Diluted N2 Plasmas with Capacitive and Inductive Coupling
Takeshi KitajimaAkihiro KubotaToshiki Nakano
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2008 年 128 巻 10 号 p. 615-618

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抄録
Nitrogen atom densities in rare-gas diluted N2 plasmas are diagnosed by using Vacuum Ultra Violet Absorption Spectroscopy (VUVAS). The influence of rare-gas dilution for low pressure (20 mTorr) inductively coupled plasma is that N atom density shows a peak around 3 % of N2 fraction due to the increase of the high energy electrons. The N2 ion density, another precursor for nitridation, did not show a peak even for the high rare-gas fraction. On the other hand, capacitively coupled plasma operated at 0.5 Torr range showed no steep increase of N atom density. The optical diagnostics shows that rare-gas dilution of N2 plasma leads to the change of reactant flux ratio between neutral atoms and ions.
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© 2008 by the Institute of Electrical Engineers of Japan
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