抄録
Chemical vapor depositions using nonthermal atmospheric pressure plasmas have attracted special attentions because they eliminate expensive and complicated vacuum systems and provide many more active chemical species. We report an advanced 2.45 GHz microwave-excited blowing plasma system which was fabricated using microstrip lines, instead of conventional waveguides. The plasma system provides a plasma source with a long lifetime, stability, robustness, and simplicity even at atmospheric pressure. The blowing plasma permits the carbon materials deposition in atmospheric ambient air.
