Substrate Surrounding Type Magnetron Sputtering Equipment Comparison of HiPIMS and DCMS Drive

Abstract

For the hard coating field, we have developed a new physical vapor deposition (PVD) technology for one-piece coating of rod parts, a magnetron sputtering device in which a cylindrical target surrounds the substrate. TiN films formed under HiPIMS and DCMS drive of the device using cylindrical Ti target were compared. It was shown that a high-hardness and dense TiN film, which is characteristic of the HiPIMS method, can be formed using the prototype substrate surrounding type magnetron sputtering device.