IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Present Situation and Future Prospect of ULSI High Aspect Ratio SiO2 Etching Technology
Yasuhiro Horiike
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1997 Volume 117 Issue 10 Pages 999-1003

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